US Patent Issued to Intel on March 24 for "Fin trim plug structures with metal for imparting channel stress" (Oregon Inventors)

ALEXANDRIA, Va., March 24 -- United States Patent no. 12,588,252, issued on March 24, was assigned to Intel Corp. (Santa Clara, Calif.).

"Fin trim plug structures with metal for imparting channel stress" was invented by Tao Chu (Portland, Ore.), Feng Zhang (Hillsboro, Ore.), Minwoo Jang (Portland, Ore.), Yanbin Luo (Portland, Ore.), Chia-Ching Lin (Portland, Ore.) and Ting-Hsiang Hung (Beaverton, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Fin trim plug structures with metal for imparting channel stress are described. In an example, an integrated circuit structure includes a fin including silicon, the fin having a top and sidewalls, wherein the top has a longest dimension along a direction. A first i...