US Patent Issued to Intel on June 9 for "Spacer self-aligned via structures using assisted grating for gate contact or trench contact" (Oregon Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,652,850, issued on June 9, was assigned to Intel Corp. (Santa Clara, Calif.).

"Spacer self-aligned via structures using assisted grating for gate contact or trench contact" was invented by Leonard P. Guler (Hillsboro, Ore.), Tsuan-Chung Chang (Portland, Ore.), Charles H. Wallace (Portland, Ore.), Tahir Ghani (Portland, Ore.) and Desalegne B. Teweldebrhan (Sherwood, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Spacer self-aligned via structures for gate contact or trench contact are described. In an example, an integrated circuit structure includes a plurality of gate structures above a substrate. A plurality of conductive trench contact structures...