US Patent Issued to Intel on Feb. 17 for "Continuous gate and fin spacer for advanced integrated circuit structure fabrication" (Oregon Inventors)

ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,557,617, issued on Feb. 17, was assigned to Intel Corp. (Santa Clara, Calif.).

"Continuous gate and fin spacer for advanced integrated circuit structure fabrication" was invented by Heidi M. Meyer (Hillsboro, Ore.), Ahmet Tura (Portland, Ore.), Byron Ho (Hillsboro, Ore.), Subhash Joshi (Hillsboro, Ore.), Michael L. Hattendorf (Portland, Ore.) and Christopher P. Auth (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of the disclosure are in the field of advanced integrated circuit structure fabrication and, in particular, 10 nanometer node and smaller integrated circuit structure fabrication and the resulting structures. In an ex...