US Patent Issued to Intel on Feb. 10 for "Device, method and system to provide epitaxial structures opposite sides of a separation layer between channel stacks" (Oregon Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,381, issued on Feb. 10, was assigned to Intel Corp. (Santa Clara, Calif.).

"Device, method and system to provide epitaxial structures opposite sides of a separation layer between channel stacks" was invented by Abhishek Sharma (Portland, Ore.), Anand Murthy (Portland, Ore.), Tahir Ghani (Portland, Ore.) and Wilfred Gomes (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques and mechanisms for providing epitaxial structures of an integrated circuit (IC). In an embodiment, an IC comprises a separation layer, and first and second channel stack structures at opposite surfaces of the separation layer. A first source or drain (SD) stru...