ALEXANDRIA, Va., Dec. 23 -- United States Patent no. 12,506,076, issued on Dec. 23, was assigned to Intel Corp. (Santa Clara, Calif.).
"Power rail between fins of a transistor structure" was invented by Andy Chih-Hung Wei (Yamhill, Ore.) and Guillaume Bouche (Portland, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments described herein may be related to apparatuses, processes, and techniques related to a transistor structure that includes a buried power rail (BPR) located within the transistor structure at a level below a height of one or more of the fins of the transistor structure. The BPR may be located proximate to a bottom substrate of the transistor structure. In embodiments, the transisto...