US Patent Issued to Intel on Dec. 16 for "Formation of a reconstituted circuit device using flow of a material by capillary action" (Arizona Inventors)

ALEXANDRIA, Va., Dec. 16 -- United States Patent no. 12,500,132, issued on Dec. 16, was assigned to Intel Corp. (Santa Clara, Calif.).

"Formation of a reconstituted circuit device using flow of a material by capillary action" was invented by Omkar Karhade (Chandler, Ariz.) and Nitin Deshpande (Chandler, Ariz.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Techniques and mechanisms for a reconstituted circuit device to be formed using a flow of material, by capillary action, in a region between a first die and a second die. In an embodiment, a rigid mass extends around, and between, the first die and the second die. The rigid mass comprises a first body of a first material, and a second body of second materia...