US Patent Issued to Intel on Aug. 25 for "Fabrication of gate-all-around integrated circuit structures having pre-spacer-deposition wide cut gates" (Oregon Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,720,803, issued on Aug. 25, was assigned to Intel Corp. (Santa Clara, Calif.).

"Fabrication of gate-all-around integrated circuit structures having pre-spacer-deposition wide cut gates" was invented by Leonard P. Guler (Hillsboro, Ore.), Sairam Subramanian (Portland, Ore.), Conor P. Puls (Portland, Ore.), Charles H. Wallace (Portland, Ore.) and Tahir Ghani (Portland, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Gate-all-around integrated circuit structures having pre-spacer-deposition wide cut gates are described. For example, an integrated circuit structure includes a first vertical arrangement of horizontal nanowires and a second vertical arran...