ALEXANDRIA, Va., April 7 -- United States Patent no. 12,598,803, issued on April 7, was assigned to Intel Corp. (Santa Clara, Calif.).
"Integrated circuit structures having gate cut offset" was invented by Sukru Yemenicioglu (Portland, Ore.), Xinning Wang (Portland, Ore.), Allen B. Gardiner (Portland, Ore.), Tahir Ghani (Portland, Ore.), Mohit K. Haran (Hillsboro, Ore.) and Leonard P. Guler (Hillsboro, Ore.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Integrated circuit structures having gate cut offset, and methods of fabricating integrated circuit structures having gate cut offset, are described. For example, an integrated circuit structure includes a first vertical stack of horizontal nanowires. A secon...