ALEXANDRIA, Va., July 14 -- United States Patent no. 12,679,818, issued on July 14, was assigned to Institute of Science Tokyo (Tokyo), Fukushima Medical University (Fukushima, Japan) and Taiyo Nippon Sanso Corp. (Tokyo).

"Radioactive halogen labeling precursor compound" was invented by Hiroshi Tanaka (Tokyo), Kazuhiro Takahashi (Fukushima, Japan) and Miho Suzuki (Fukushima, Japan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is, as a radioactive halogen labeling precursor compound that is highly reactive and stable, a compound represented by the following general formula (II):wherein R1 and R2 each independently represent an alkyl group having 5 to 20 carbon atoms, X1 and X2 each independently rep...