US Patent Issued to INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES on Feb. 10 for "Semiconductor apparatus having staggered structure and method of manufacturing the same, and electronic device" (Chinese, American Inventors)

ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,550,391, issued on Feb. 10, was assigned to INSTITUTE OF MICROELECTRONICS, CHINESE ACADEMY OF SCIENCES (Beijing).

"Semiconductor apparatus having staggered structure and method of manufacturing the same, and electronic device" was invented by Huilong Zhu (Poughkeepsie, N.Y.), Xuezheng Ai (Beijing) and Yongkui Zhang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "A semiconductor apparatus having a staggered structure, a method of manufacturing a semiconductor apparatus, and an electronic device including the semiconductor apparatus. The semiconductor apparatus includes a first element and a second element on a substrate. The first element and the...