US Patent Issued to Inspiring Atoms on Sept. 15 for "Control system and method for ion energy distribution in plasma process chambers using tailored waveform generators" (Singaporean Inventor)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,450, issued on Sept. 15, was assigned to Inspiring Atoms Pte Ltd (Singapore).

"Control system and method for ion energy distribution in plasma process chambers using tailored waveform generators" was invented by Yang Pan (Singapore).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed herein is a real-time control and optimization system for a plasma process system, specifically focusing on a tailored waveform generator coupled to a chuck. The system employs a system controller that divides the process recipe into a setting phase and a processing phase. The setting phase is used to determine optimized slopes for voltage waveforms during plasma p...