US Patent Issued to Inpria on March 3 for "Multiple patterning with organometallic photopatternable layers with intermediate freeze steps" (Belgian, American Inventors)

ALEXANDRIA, Va., March 3 -- United States Patent no. 12,566,377, issued on March 3, was assigned to Inpria Corp. (Corvallis, Ore.).

"Multiple patterning with organometallic photopatternable layers with intermediate freeze steps" was invented by Peter De Schepper (Wijnegem, Belgium), Jason K. Stowers (Corvallis, Ore.), Sangyoon Woo (Heverlee, Belgium), Michael Kocsis (Albany, Ore.) and Alan J. Telecky (Albany, Ore.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Multiple patterning approaches using radiation sensitive organometallic materials is described. In particular, multiple patterning approaches can be used to provide distinct multiple patterns of organometallic material on a hardmask or other substrate ...