US Patent Issued to Industry-Academic Cooperation Foundation, YONSEI UNIVERSITY on Sept. 15 for "Mass fabrication method for a spacer inserted thermoelectric device" (South Korean Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,740,320, issued on Sept. 15, was assigned to Industry-Academic Cooperation Foundation, YONSEI UNIVERSITY (Seoul, South Korea).

"Mass fabrication method for a spacer inserted thermoelectric device" was invented by Woochul Kim (Seoul, South Korea), Sungjin Park (Seoul, South Korea) and Yousung Choi (Seoul, South Korea).

According to the abstract* released by the U.S. Patent & Trademark Office: "An embodiment provides a mass-manufacturing method of new structure thermoelectric elements, including: (a) filling a thermoelectric material powder so as to surround the inner and outer parts of a spacer portion located inside a mold portion; (b) pressurizing the spacer portion by a punch port...