US Patent Issued to Industrial Technology Research Institute on June 30 for "Addition system and method of reducing agent in semiconductor manufacturing process" (Taiwanese Inventors)

ALEXANDRIA, Va., July 16 -- United States Patent no. 12,672,502, issued on June 30, was assigned to Industrial Technology Research Institute (Hsinchu, Taiwan).

"Addition system and method of reducing agent in semiconductor manufacturing process" was invented by Jia-Cheng Sun (Changhua County, Taiwan), Jui-Hsiang Cheng (Taichung City, Taiwan), I-Ling Nien (Hsinchu County, Taiwan), Chia-Yen Kuo (Taipei City, Taiwan) and Shou-Nan Li (Nantou County, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "An addition system of a reducing agent in a semiconductor manufacturing process includes pre-treatment and post-treatment gas concentration detection devices, a process exhaust gas treatment device, a reducing age...