US Patent Issued to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE on April 21 for "Photosensitive composition and film prepared from the same" (Taiwanese Inventors)

ALEXANDRIA, Va., April 21 -- United States Patent no. 12,607,932, issued on April 21, was assigned to INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (Hsinchu, Taiwan).

"Photosensitive composition and film prepared from the same" was invented by Yu-Yang Su (New Taipei, Taiwan), Chih-Jen Yang (Taoyuan, Taiwan) and Yung-Lung Tseng (Zhubei, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "A photosensitive composition and film prepared from the same are provided. The photosensitive composition includes 100 parts by weight of polyimide, 0.25-50 parts by weight of initiator and 0.25-100 parts by weight of crosslinking agent. The polyimide is a product of a reactant (a) and a reactant (b) via a reaction. The reactant...