US Patent Issued to IMS Nanofabrication on Sept. 15 for "Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus" (Austrian Inventors)

ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,738,453, issued on Sept. 15, was assigned to IMS Nanofabrication GmbH (Brunn am Gebirge, Austria).

"Method for determining focal properties in a target beam field of a multi-beam charged-particle processing apparatus" was invented by Christoph Spengler (Vienna), Wolf Naetar (Vienna) and Matthias Liertzer (Hinterbruhl, Austria).

According to the abstract* released by the U.S. Patent & Trademark Office: "A method for determining focal properties in a target beam field of a charged-particle multi-beam processing apparatus is presented, where the focal properties relate to aperture images formed by the beamlets at or near the target within this apparatus, such as height of focus, astigm...