ALEXANDRIA, Va., April 21 -- United States Patent no. 12,610,801, issued on April 21, was assigned to Imec vzw (Leuven, Belgium).

"Metallization process for an integrated circuit" was invented by Victor Hugo Vega Gonzalez (Heverlee, Belgium), Bilal Chehab (Leuven, Belgium), Julien Ryckaert (Schaerbeek, Belgium), Zsolt Tokei (Leuven, Belgium), Serge Biesemans (Leuven, Belgium) and Naoto Horiguchi (Leuven, Belgium).

According to the abstract* released by the U.S. Patent & Trademark Office: "The disclosure relates to a metallization process for an integrated circuit. One example metallization process includes a method for forming an integrated circuit that includes providing a semiconductor structure having two transistor structures, a gate ...