ALEXANDRIA, Va., Feb. 17 -- United States Patent no. 12,551,984, issued on Feb. 17, was assigned to II-VI DELAWARE INC. (Wilmington, Del.).
"Methods of forming diamond composite CMP pad conditioner" was invented by Prashant G. Karandikar (Avondale, Pa.), Michael K. Aghajanian (Newark, Del.), Edward Gratrix (Monroe, Conn.) and Brian J. Monti (Avon, Conn.).
According to the abstract* released by the U.S. Patent & Trademark Office: "Methods of forming chemical-mechanical polishing/planarization pad conditioner bodies made from diamond-reinforced reaction bonded silicon carbide, with diamond particles protruding or "standing proud" of the rest of the surface, and uniformly distributed on the cutting surface. In one embodiment, the diamond par...