US Patent Issued to HYPER-OPTICS (BEIJING) TECHNOLOGIES on Sept. 22 for "Alignment method based on holographic lithography, system and device" (Chinese Inventors)

ALEXANDRIA, Va., Sept. 24 -- United States Patent no. 12,743,036, issued on Sept. 22, was assigned to HYPER-OPTICS (BEIJING) TECHNOLOGIES LTD. (Beijing).

"Alignment method based on holographic lithography, system and device" was invented by Wen Xie (Beijing), Zhiyuan Niu (Beijing), Min Cong (Beijing), Zhi Cheng (Beijing), Hongpeng Qin (Beijing) and Kaicheng Wang (Beijing).

According to the abstract* released by the U.S. Patent & Trademark Office: "An alignment method and related system and device are based on holographic lithography. The method includes controlling an illumination light to generate an alignment image after passing through an alignment image area of a holographic mask. The alignment image includes first and second period i...