ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,545,608, issued on Feb. 10, was assigned to HPCL-MITTAL ENERGY Ltd. (Bathinda, India).
"System and method for treating spent caustic effluent using chlorine dioxide solution" was invented by Balasubrahmanyam Avvaru (Perala, India), Mainak Ray (Midnapore, India) and Vineet Kumar Gupta (Faridabad, India).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present invention generally relates to a system and method for treating spent caustic effluent using chlorine dioxide solution. The system comprises a spent caustic storage tank for receiving spent caustic obtained from refinery operations; an acid storage container connected to the spent caustic storage t...