ALEXANDRIA, Va., June 16 -- United States Patent no. 12,659,595, issued on June 16, was assigned to HONOR DEVICE Co. LTD. (Shenzhen, China).
"Method and apparatus for determining exposure parameter" was invented by Jirun Xu (Shenzhen, China).
According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments of this application relate to the terminal field, and provide a method and an apparatus for determining an exposure parameter. The method is applied to an electronic device, and includes: identifying a current shooting scenario, and determining at least one camera lens corresponding to the current shooting scenario, the first camera lens is corresponding to a first exposure meter, and the first exposure meter is p...