US Patent Issued to Honeywell Safety Products USA on Sept. 8 for "System and method for absorbing moisture within a face mask" (New Jersey Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,727,632, issued on Sept. 8, was assigned to Honeywell Safety Products USA Inc. (Latham, N.Y.).

"System and method for absorbing moisture within a face mask" was invented by Charlie Han (Morris Plains, N.J.), Kevin Lu (Morris Plains, N.J.), Robin Xiang (Morris Plains, N.J.) and Jerry Shen (Morris Plains, N.J.).

According to the abstract* released by the U.S. Patent & Trademark Office: "Embodiments relate generally to systems and methods for absorbing moisture within a face mask worn by a user. A face mask may comprise at least one layer of filtration material configured to filter one or more harmful substances from the air breathed by a user; at least one layer of absorbent material c...