ALEXANDRIA, Va., Aug. 5 -- United States Patent no. D1,139,953, issued on Aug. 4, was assigned to Honeywell Safety Products USA Inc. (Latham, N.Y.).
"Face mask" was invented by Daniel Yee (Santa Margarita, Calif.), Jana Bacinska (Brno, Czech Republic), Jose Antonio Fosado Rodriguez (Santa Barbara, Mexico), Marie K. Hammer (Smithfield, R.I.), Mark Peurifoy (Phoenix), Sayanti Basu (Fort Mill, S.C.) and Alex Rochat (Ames, Iowa).
The patent was filed on May 20, 2024, under Application No. D/943,041.
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