ALEXANDRIA, Va., Oct. 21 -- United States Patent no. 12,770,246, issued on Oct. 20, was assigned to HON HAI PRECISION INDUSTRY Co. LTD. (New Taipei City, Taiwan) and Foxconn Technology Group Co. Ltd. (Guangdong Province, China).
"Defect detecting apparatus and method" was invented by Yung-Hui Li (New Taipei City, Taiwan), Kai-Lin Yang (New Taipei City, Taiwan) and Yi-Rong Lin (New Taipei City, Taiwan).
According to the abstract* released by the U.S. Patent & Trademark Office: "A defect detecting apparatus and method are provided. The defect detecting apparatus receives an image to be tested. The defect detecting apparatus detects the image to be tested through a defect detecting model to generate an anomaly score corresponding to the imag...