US Patent Issued to HITHIUM TECH HK on April 7 for "Anode plate for film plating machine and film plating machine" (Chinese Inventors)

ALEXANDRIA, Va., April 7 -- United States Patent no. 12,595,582, issued on April 7, was assigned to HITHIUM TECH HK Ltd. (Kowloon, Hong Kong).

"Anode plate for film plating machine and film plating machine" was invented by Xichong Zhang (Xiamen, China), Yuyuan Wu (Xiamen, China), Qian Zhao (Xiamen, China), Qin Zhang (Xiamen, China) and Jinhua Lan (Xiamen, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "An anode plate for a film plating machine and a film plating machine are provided. The anode plate is formed by splicing a plurality of anode plate splicing units, and two adjacent anode plate splicing units are separated by an insulating medium. Each anode plate splicing unit is connected with a power su...