US Patent Issued to Hitachi High-Tech on Sept. 9 for "Pattern matching device, pattern measurement system, and non-transitory computer-readable medium" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 10 -- United States Patent no. 12,412,275, issued on Sept. 9, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Pattern matching device, pattern measurement system, and non-transitory computer-readable medium" was invented by Liang Li (Tokyo), Yuichi Abe (Tokyo) and Wataru Nagatomo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A pattern matching apparatus includes a computer system configured to execute pattern matching processing between first pattern data based on design data and second pattern data representing a captured image of an electron microscope. The computer system acquires a first edge candidate group including one or more first edge candidates, acquires a selectio...