US Patent Issued to Hitachi High-Tech on Sept. 8 for "Defect inspection device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 8 -- United States Patent no. 12,730,065, issued on Sept. 8, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Defect inspection device" was invented by Takeru Utsugi (Tokyo), Toshifumi Honda (Tokyo) and Kenshiro Ohtsubo (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a technique capable of reducing an influence of an inter-beam phase difference unrelated to a defect and accurately detecting even a defect having a low aspect ratio by a defect inspection device using differential interference contrast. To achieve the above purpose, provided is the defect inspection device using differential interference contrast that inspects a specimen using light. The defect inspecti...