ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,736,487, issued on Sept. 15, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Inspection system" was invented by Yohei Nakamura (Tokyo), Naoko Takeda (Tokyo), Natsuki Tsuno (Tokyo), Satoshi Takada (Tokyo) and Heita Kimizuka (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an inspection system capable of estimating electric characteristics of a sample with high accuracy regardless of an initial charging state of a wafer. The inspection system includes a charged particle beam device and a computer system, and inspects the electric characteristics of the sample. The inspection system evaluates initial charging of an inspection region inc...