US Patent Issued to HITACHI HIGH-TECH on Sept. 1 for "Optical foreign matter inspection device" (Japanese Inventors)

ALEXANDRIA, Va., Sept. 1 -- United States Patent no. 12,723,991, issued on Sept. 1, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Optical foreign matter inspection device" was invented by Hisaaki Kanai (Tokyo) and Masami Makuuchi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical foreign matter inspection device includes a rotation stage; a laser light source; a sensor that is a charge accumulation type sensor; a detecting circuit; a light emission timing signal generating circuit configured to generate a light emission timing synchronizing signal synchronized with laser emission; a trigger signal generating circuit configured to receive a first signal (a stage encoder signal) indicating a ...