US Patent Issued to Hitachi High-Tech on Oct. 6 for "Plasma processing apparatus and gas exhaust method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,945, issued on Oct. 6, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Plasma processing apparatus and gas exhaust method" was invented by Tzu Wei Tseng (Tokyo), Akito Kochi (Tokyo), Kenji Imamoto (Tokyo) and Yuzuru Yamamoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A plasma processing apparatus capable of reducing an error in operation by automating exhaust via a gas pipe, including a first valve disposed between a gas cylinder and a mass flow controller; a second valve configured to exhaust a gas filled from a dry pump side; a third valve disposed downstream of the mass flow controller; a fourth valve configured to exhaust a gas fille...