US Patent Issued to Hitachi High-Tech on Oct. 6 for "Localization apparatus and method" (Japanese Inventors)

ALEXANDRIA, Va., Oct. 6 -- United States Patent no. 12,755,416, issued on Oct. 6, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Localization apparatus and method" was invented by Mitsuji Ikeda (Tokyo), Yasutaka Toyoda (Tokyo), Yuichi Abe (Tokyo), Makoto Sato (Tokyo), Haruhiko Higuchi (Tokyo) and Masayoshi Ishikawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to facilitate generation of teacher data and to detect position coordinates with high reliability, there is provided a localization apparatus including: a deep learning model trained by using training image data in which position coordinates desired to be detected are specified and teacher image data in which a pixel group represent...