US Patent Issued to Hitachi High-Tech on May 5 for "Electrolyte measuring structure, flow-type ion-selective electrode using the same, and electrolyte measuring device" (Japanese Inventors)

ALEXANDRIA, Va., May 5 -- United States Patent no. 12,618,797, issued on May 5, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Electrolyte measuring structure, flow-type ion-selective electrode using the same, and electrolyte measuring device" was invented by Ichiro Yamakawa (Tokyo), Kie Orihashi (Tokyo), Hiroki Nakatsuchi (Tokyo), Isamu Yoshida (Tokyo) and Masafumi Miyake (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electrolyte measuring structure includes a housing and a sealing material. The electrolyte measuring structure being connectable to another electrolyte measuring structure via the sealing material. The housing includes a main body having a flow path therethrough and a fixing struc...