US Patent Issued to Hitachi High-Tech on March 17 for "Pattern matching device, pattern measuring system, pattern matching program" (Japanese Inventors)

ALEXANDRIA, Va., March 17 -- United States Patent no. 12,579,778, issued on March 17, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Pattern matching device, pattern measuring system, pattern matching program" was invented by Liang Li (Tokyo), Wataru Nagatomo (Tokyo) and Yuichi Abe (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure proposes a pattern matching device capable of achieving matching processing that is characterized by involving a learning function even for a semiconductor pattern including a repetitive pattern, in particular. The pattern matching device pertaining to the present disclosure is provided with a learning unit for estimating a first correlation image havi...