US Patent Issued to HITACHI HIGH-TECH on June 9 for "Apparatus diagnostic apparatus, semiconductor manufacturing apparatus system, and semiconductor apparatus manufacturing system" (Japanese, Taiwanese Inventors)

ALEXANDRIA, Va., June 9 -- United States Patent no. 12,651,732, issued on June 9, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Apparatus diagnostic apparatus, semiconductor manufacturing apparatus system, and semiconductor apparatus manufacturing system" was invented by Satoru Matsukura (Tokyo), Yoshito Kamaji (Hsinchu, Taiwan), Nanako Tamari (Tokyo), Akira Kagoshima (Tokyo) and Masahiro Sumiya (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus diagnostic apparatus that performs a computation process using data acquired from a semiconductor apparatus manufacturing apparatus having a reference chamber to create reference chamber feature quantity map data by mapping a feature quantity onto...