US Patent Issued to HITACHI HIGH-TECH on July 7 for "Optical-type foreign matter inspection device" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,674,763, issued on July 7, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Optical-type foreign matter inspection device" was invented by Tomoharu Nagashima (Tokyo), Hisaaki Kanai (Tokyo), Masami Makuuchi (Tokyo), Masaya Yamamoto (Tokyo) and Shunichi Matsumoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An optical-type foreign matter inspection device that inspects a foreign matter on a surface of a sample includes a rotary stage that is driven to rotate and on which the sample is placed, a laser light source configured to irradiate the surface of the sample with a laser beam, variable optical attenuators of two or more stages configured to a...