US Patent Issued to HITACHI HIGH-TECH on July 7 for "Defect inspection device and defect inspection method" (Japanese Inventors)

ALEXANDRIA, Va., July 7 -- United States Patent no. 12,674,764, issued on July 7, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Defect inspection device and defect inspection method" was invented by Yuta Urano (Tokyo), Toshifumi Honda (Tokyo), Takanori Kondo (Tokyo) and Yuta Tagawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "The system has a scanning device that rotates and drives the sample stage so as to change the relative positions of the sample and the illumination optical system; a plurality of detection optical systems that concentrate scattered illumination light from the surface of the sample; a plurality of sensors that convert the scattered illumination light concentrated by a corres...