US Patent Issued to HITACHI HIGH-TECH on July 21 for "Electron beam application device" (Japanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,688,992, issued on July 21, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Electron beam application device" was invented by Takashi Ohshima (Tokyo), Naohiro Kohmu (Tokyo), Hideo Morishita (Tokyo), Tatsuro Ide (Tokyo), Yoichi Ose (Tokyo), Junichi Katane (Tokyo) and Toshihide Agemura (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A light source that emits pulse excitation light includes a laser light source, an optical splitter that splits a pulse laser beam into a plurality of pulse laser beams, phase adjusters and optical amplifiers provided for the pulse laser beams, and an optical combiner that combines the plurality of pulse laser beams wh...