ALEXANDRIA, Va., July 14 -- United States Patent no. 12,680,953, issued on July 14, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Far-infrared spectroscopic device, and far-infrared spectroscopic method" was invented by Touya Ono (Tokyo), Kei Shimura (Tokyo), Mizuki Mohara (Tokyo) and Kenji Aiko (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "This far-infrared analyzing device comprises: a holding mechanism configured to be capable of holding specimen in moist air; a detector for detecting light obtained by emitting a far-infrared light beam onto the specimen; and a signal processing unit for computing an absorption spectrum of the specimen from a signal from the detector. The signal processing uni...