US Patent Issued to Hitachi High-Tech on Jan. 20 for "Apparatus diagnostic system, apparatus diagnostic apparatus, semiconductor device manufacturing system, and apparatus diagnostic method" (Japanese Inventors)

ALEXANDRIA, Va., Jan. 20 -- United States Patent no. 12,530,023, issued on Jan. 20, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Apparatus diagnostic system, apparatus diagnostic apparatus, semiconductor device manufacturing system, and apparatus diagnostic method" was invented by Nanako Tamari (Tokyo), Masahiro Sumiya (Tokyo), Akira Kagoshima (Tokyo), Satoru Matsukura (Tokyo) and Yuji Nagatani (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An apparatus diagnostic system for diagnosing conditions of a semiconductor manufacturing apparatus includes an apparatus diagnostic apparatus that outputs soundness indicators by a first algorithm with sensor data collected from the semiconductor manufacturin...