US Patent Issued to Hitachi High-Tech on Feb. 24 for "Sample inspection apparatus, inspection system, thin piece sample fabrication apparatus, and method for inspecting sample" (Japanese Inventors)

ALEXANDRIA, Va., Feb. 24 -- United States Patent no. 12,562,335, issued on Feb. 24, was assigned to Hitachi High-Tech Corp. (Tokyo).

"Sample inspection apparatus, inspection system, thin piece sample fabrication apparatus, and method for inspecting sample" was invented by Masahiro Yoshida (Tokyo), Junichi Fuse (Tokyo), Norio Sato (Tokyo) and Hirotsugu Kajiyama (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A sample inspection apparatus is provided. The invention is directed to a sample inspection apparatus 200 that includes an inspection means that is executed when a sample 11 is placed on a stage 8, the inspection means including the steps of (a) scanning a surface of the sample 11 with an electron b...