ALEXANDRIA, Va., Feb. 11 -- United States Patent no. 12,546,805, issued on Feb. 10, was assigned to Hitachi High-Tech Corp. (Tokyo).
"Sample inspection apparatus" was invented by Tomoko Shimamori (Tokyo), Yasuhiko Nara (Tokyo), Junichi Fuse (Tokyo) and Akira Kageyama (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is a sample inspection apparatus capable of identifying a capacitive fault or a potential faulty point where an electrical tolerance is low. The sample inspection apparatus includes: a charged particle optical system configured to irradiate a sample 19 with a charged particle beam; a first probe 21a configured to come into contact with the sample; an amplifier 23 having an input term...