ALEXANDRIA, Va., Dec. 31 -- United States Patent no. 12,512,294, issued on Dec. 30, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).
"Charged particle beam device" was invented by Kazuo Ootsuga (Tokyo), Kazufumi Yachi (Tokyo), Makoto Sakakibara (Tokyo), Heita Kimizuka (Tokyo) and Yusuke Abe (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A charged particle beam device includes: a stage 124 on which a sample 108 is to be placed; a charged particle optical system including a charged particle source 113 and an objective lens 121 that focuses a charged particle beam from the charged particle source onto the sample; and a detector 123 disposed between the objective lens and the stage and configured to detec...