US Patent Issued to HITACHI HIGH-TECH on Aug. 4 for "Foreign object height measurement method and charged particle beam device" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 5 -- United States Patent no. 12,699,063, issued on Aug. 4, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Foreign object height measurement method and charged particle beam device" was invented by Wei Sun (Tokyo), Naomasa Suzuki (Tokyo), Nobuhiro Okai (Tokyo) and Keiichiro Hitomi (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "A foreign object height measurement method including: storing in advance dependence data indicating a dependence of a calculated value of the height of the foreign object calculated from a foreign object image extracted from the charged particle image on an orientation of the foreign object; extracting a measurement target foreign object image, being an ...