ALEXANDRIA, Va., Aug. 26 -- United States Patent no. 12,400,889, issued on Aug. 26, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).
"Defect inspection device" was invented by Hiromichi Yamakawa (Tokyo), Toshifumi Honda (Tokyo), Yuta Urano (Tokyo), Shunichi Matsumoto (Tokyo), Masaya Yamamoto (Tokyo) and Eiji Arima (Tokyo).
According to the abstract* released by the U.S. Patent & Trademark Office: "A defect inspection device in which an optical axis of a detection optical system is inclined with respect to a surface of a sample, and an imaging sensor is inclined with respect to the optical axis, a height variation amount of an illumination spot in a normal direction of the surface of the sample is calculated based on an output of a height ...