US Patent Issued to HITACHI HIGH-TECH on Aug. 25 for "Electron beam application apparatus and inspection method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 25 -- United States Patent no. 12,719,008, issued on Aug. 25, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Electron beam application apparatus and inspection method" was invented by Momoyo Enyama (Tokyo), Akira Ikegami (Tokyo), Takeshi Morimoto (Tokyo) and Shun Kizawa (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "An electron beam application apparatus includes: an optical system configured to irradiate a sample with excitation light; an electron optical system configured to project, onto a camera, a photoelectron image formed by photoelectrons emitted from the sample irradiated with the excitation light; and a control unit. The optical system includes a light source configu...