US Patent Issued to HITACHI HIGH-TECH on Aug. 11 for "Mass spectrometry system, processing device, and anomaly detection method" (Japanese Inventors)

ALEXANDRIA, Va., Aug. 12 -- United States Patent no. 12,704,488, issued on Aug. 11, was assigned to HITACHI HIGH-TECH Corp. (Tokyo).

"Mass spectrometry system, processing device, and anomaly detection method" was invented by Masuyuki Sugiyama (Tokyo), Hideki Hasegawa (Tokyo) and Yuichiro Hashimoto (Tokyo).

According to the abstract* released by the U.S. Patent & Trademark Office: "In order to easily detect anomaly in a liquid chromatograph mass spectrometer, a liquid chromatography including a plurality of flow paths, a mass spectrometer, and a processing device that acquires a signal intensity that is a measurement result of a substance from the mass spectrometer are provided, each of the plurality of flow paths includes a separation col...