US Patent Issued to HIGHLIGHT TECH on July 21 for "Semiconductor waste gas treatment system and moisture-gas separator of the same" (Taiwanese Inventors)

ALEXANDRIA, Va., July 21 -- United States Patent no. 12,685,957, issued on July 21, was assigned to HIGHLIGHT TECH CORP. (Tainan City, Taiwan).

"Semiconductor waste gas treatment system and moisture-gas separator of the same" was invented by Ting Tsai (Tainan City, Taiwan), Zhi-Hao Chen (Tainan City, Taiwan) and Shao-Qing Huang (Tainan City, Taiwan).

According to the abstract* released by the U.S. Patent & Trademark Office: "Disclosed are a semiconductor waste gas treatment system and a moisture-gas separator of the same. A moisture-gas separator is communicated between a wet scrubber and an air extraction device in the semiconductor waste gas treatment system. An air inlet pipe, a separation pipe and an exhaust pipe are communicated with...