ALEXANDRIA, Va., Sept. 15 -- United States Patent no. 12,735,571, issued on Sept. 15, was assigned to Henkel AG & Co. KGaA (Duesseldorf, Germany).
"Silicone formulation with high temperature stability and clarity" was invented by Matthew Ahearn (Union, N.J.), Tianzhi Zhang (Skillman, N.J.), Christina Despotopoulou (Minneapolis), Sebastien Lanau (Duesseldorf, Germany) and Johann Klein (Duesseldorf, Germany).
According to the abstract* released by the U.S. Patent & Trademark Office: "The present disclosure is directed to a radiation curable composition comprising a (meth)acrylate functionalized polysiloxane polymer. In some embodiments the composition further comprises one or more of a crosslinker, fumed silica, a functionalized silsesquiox...