US Patent Issued to HARBIN INSTITUTE OF TECHNOLOGY, ZHENGZHOU RESEARCH INSTITUTE OF HIT on Jan. 27 for "Atomic layer deposition device for uniform coating on inner surface of dome shaped surface" (Chinese Inventors)

ALEXANDRIA, Va., Jan. 28 -- United States Patent no. 12,534,804, issued on Jan. 27, was assigned to HARBIN INSTITUTE OF TECHNOLOGY (Harbin, China) and ZHENGZHOU RESEARCH INSTITUTE OF HIT (Zhengzhou, China).

"Atomic layer deposition device for uniform coating on inner surface of dome shaped surface" was invented by Gang Gao (Harbin, China), Kun Li (Harbin, China), Jiaqi Zhu (Harbin, China), Lei Yang (Harbin, China) and Chao Duan (Harbin, China).

According to the abstract* released by the U.S. Patent & Trademark Office: "Provided is an atomic layer deposition device for uniform coating on an inner surface of a dome shaped surface. A gas channel member in the atomic layer deposition device is vertically fixed to a cabin base, and a periphera...