ALEXANDRIA, Va., April 15 -- United States Patent no. 12,601,061, issued on April 14, was assigned to HANWHA PRECISION MACHINERY Co. LTD. (Changwon-si, South Korea).
"Thin film deposition apparatus having multi-stage heaters and thin film deposition method using the same" was invented by Ram Woo (Seoul, South Korea), Seung Jun Lee (Seoul, South Korea), Sang Yeop Kim (Seoul, South Korea), Jin Hwan Lee (Seoul, South Korea) and Sang Bo Kim (Seoul, South Korea).
According to the abstract* released by the U.S. Patent & Trademark Office: "A thin film deposition apparatus includes: a chamber configured to process a plurality of substrates; a plurality of heater members disposed to correspond to the substrates to heat the substrates; a plurality ...